2019: Exhibition at the SPIE Advanced Lithography Conference in San José (USA)

The SPIE Advanced Lithography in San José took place from Tuesday, 26. February to Wednesday, 27. February 2019. SPIE Advanced Lithography is an internationally recognized forum for reporting research and development in lithography. It brings together the lithography community from academia to production engineers from semiconductor industry. Nano analytik GmbH presented a parallel-cantilever AFM tool capable for high-throughput imaging.

Our United States partner SEIWA Optical America Inc. exhibited the new unique active-cantilever application in integrated Optical-AFM wafer inspection system at the SPIE 2019 meeting.  The AFM system uses cantilevers with high-aspect ratio Silicon tips for high performance trench-depth characterization and inspection of advanced masks.

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