Tip- and laser-based nanofabrication up to 100 mm with sub-nanometre precision
Scientists from Technical University Ilmenau, Germany, presented mentioned paper at SPIE Advanced Lithography, 2020, San Jose, California, United States. This paper presents a part of the results obtained in the frame of large DFG Research Training Group project "Tip- and Laserbased 3D-Nanofabrication in extended macroscopic working areas" (GRK 2182) at the Technische University of Ilmenau, Germany.
Ingo Ortlepp; Michael Kühnel; Martin Hofmann; Laura Weidenfeller; Johannes Kirchner; Shraddha Supreeti; Rostyslav Mastylo; Mathias Holz; Thomas Michels; Roland Füßl; Ivo W. Rangelow; Thomas Fröhlich; Denis Dontsov; Christoph Schäffel; Eberhard Manske
Proc. SPIE 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020, 113240A (23 March 2020)
