High-throughput process chain for single electron transistor devices based on field-emission scanning probe lithography and Smart Nanoimprint lithography technology

C. Lenk, Y. Krivoshapkina, M. Hofmann, S. Lenk, T. Ivanov, I.W. Rangelow, A. Ahmad, A. Reum, M. Holz, T. Glinsner, M. Eibelhuber, D. Treiblmayr, B. Schamberger, M. Chouiki, B.T. Chan, Z. el Otell and J.-F. de Marneffe

Journal of Vacuum Science and Technology B 37, 021603 (2019)

DOI: 10.1116/1.5067269

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