High throughput AFM inspection system with parallel active cantilevers

M. Holz, C. Reuter, A. Ahmad, A. Reum, M. Hofmann, T. Ivanov,  I.W. Rangelow, J. Stauffenberg, E. Manske, C. Du, X.Q. Zhou, N. Okamoto, A.N. Takashima and H.-S. Lee

SPIE Proceedings Volume 11148, Photomask Technology 2019; 111481E (2019).

Presented at the SPIE Photomask Technology + EUV Lithography Conference 2019, Monterey (CA), USA.

DOI: 10.1117/12.2537009