Atomic force microscope integrated into a scanning electron microscope for fabrication and metrology at the nanometer scale

M. Holz, C. Reuter, A. Reum, A. Ahmad, M. Hofmann, T. Ivanov, S. Mechold and I.W. Rangelow

SPIE Proceedings Volume 11148, Photomask Technology 2019; 111481F (2019).

Presented at the SPIE Photomask Technology + EUV Lithography Conference 2019, Monterey (CA), USA.

DOI: 10.1117/12.2537018

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