Atomic force microscope integrated into a scanning electron microscope for fabrication and metrology at the nanometer scale

The international technical group of SPIE dedicated to the advancement of photomask technology announced the 3rd Place Winner of Best Poster devoted on “Atomic force microscope integrated into a scanning electron microscope for fabrication and metrology at the nanometer scale”.

Mathias Holz, Christoph Reuter, and Alexander Reum
nano analytik GmbH
Ehrenbergstraße 1, 98693 Ilmenau, Germany

Ahmad Ahmad, Martin Hofmann, Tzvetan Ivanov, Stephan Mechold, and Ivo W. Rangelow
Department of Micro- and Nanoelectronic Systems
Institute of Micro and Nanoelectronics
Ilmenau University of Technology
Gustav-Kirchhoff-Str. 1, 98693 Ilmenau, Germany

BACUS - N • E • W • S
July 2020 Volume 36, Issue 7

BACUS NEWSletter July 2020