Single-Dopant Lithography – AFM-SDL

Combination of AFM and Ion Beam for Single Dopant Lithography.

The Atomic Force Microscope (AFM) is used as a tool for Single Dopant Lithography (SDL). SDL allows for generating features of single dopant atoms with high accuracy, such as Qbits, atomistic devices, and nitrogen-vacancy centers (N-V) in a diamond.

The integration of a scanning probe with an ion beam is similar to a “dynamic nano-stencil” for aligned placement of dopant atoms. The AFM provides high resolution, nondestructive imaging of the target and ensures precise navigation and positioning with sub-10nm resolution.

In addition to SPL, the AFM-SDL100 system is capable of FE­‑SPL and TB‑EBID.

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