Single-Dopant Lithography – AFM-SDL
Combination of AFM and Ion Beam for Single Dopant Lithography.
The Atomic Force Microscope (AFM) is used as a tool for Single Dopant Lithography (SDL). SDL allows for generating features of single dopant atoms with high accuracy, such as Qbits, atomistic devices, and nitrogen-vacancy centers (N-V) in a diamond.
The integration of a scanning probe with an ion beam is similar to a “dynamic nano-stencil” for aligned placement of dopant atoms. The AFM provides high resolution, nondestructive imaging of the target and ensures precise navigation and positioning with sub-10nm resolution.