2019: SPIE Photomask Technology & EUV Lithography

From September 15th to 19th, nano analytik GmbH presented at the SPIE photomask conference in Monterey (California, USA) new developments in high throughput AFM inspection systems and advanced AFMinSEM tools for correlative microscopy and nanofabrication.
The SPIE photomask conference is the international event for Extreme Ultraviolet (EUV) Lithography, advanced mask technologies and is the key meeting for mask producers, lithographic emerging technologists and developers of novel mask technologies.

Our main topic was the Quattro Cantilever Array technology. With it, the the acquisition throughput can be multiplied by using up to four parallel cantilever probes. Prospectively, this technology will enable imaging of large samples on the millimeter scale at sub-nanometer resolution in reasonable time. This unique atomic force microscope from nano analytik GmbH in Ilmenau is designed for reliable parallel cantilever operation where every cantilever works autonomous like one AFM. The high throughput data acquisition workflow of the Quattro AFM can acquire four or more high-res images and stitch them automatically in one large 0.5mm x 0.25mm image. For more information, please read our publication presented at SPIE 2019: DOI: 10.1117/12.2537009