2016: nano analytik GmbH presents the new AFMinSEM at the 38th Symposium on Applied Surface Analysis
Nano analytik GmbH has presented the new AFMinSEM for vacuum and single ion implantation use at the 38th Symposium on Applied Surface Analysis, which took place in Albany, NY, USA. An increase in imaging resolution and measurement throughput enables the application of this instrument for quality control tasks in the semiconductor industry , as "SEM extended workbench". The AFMinSEM includes exceptional modularity that allows simultaneous use of SEM, FIB, EBID and AFM techniques as well as correlative imaging configurations. Sophisticated metrological analysis software and high-performance digital control maintain the AFMinSEM position at the worldwide market's leading edge. The AFMinSEM software itself also offers flexibility, which is one of the reasons why the industry customer uses it. Based on the exceptional flexibility of the AFMinSEM tools and recent ground-breaking insights function, we postulate that this tool has the potential to cover all advanced capabilities of the combination of SEM and AFM technologies.