2015: SPIE Advanced Lithography Conference, San Jose

At the SPIE Advanced Lithography Conference 2015 (San Jose, USA) nano analytik GmbH presented a paper on high-speed AFM-tool for metrology.

A significant improvement in performance of such cantilevers with respect to deflection sensitivity (atomic resolution) and temperature stability (zero thermal drift) has been achieved by using an integrated Wheatstone bridge configuration. Due to the employment of effective cross-talk isolation and temperature-drift compensation, the performance of these cantilevers was significantly improved. In order to enhance the speed of AFM measurements we are presenting a fast cantilever-approach technology, Q-factor-control and novel adaptive scanning speed procedure. Examples of AFM measurements with high scanning speed (up to 200 lines/s) committed to advanced lithography process development have been demonstrated.
DOI: 10.1117/12.2085760

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