2021: Single Dopant Atom Lithography - Invited talk at the SPIE Advanced Lithography
At the recent SPIE Advanced Lithography Conference 2021, scientists from the Universität Leipzig, Lawrence Berkeley National Laboratory Berkeley and Technische Universität Ilmenau presented a technology for Single Dopant Atom Lithography for the fabrication of quantum computers and low power electronic devices. The purpose of this technology is to enable the effective fabrication of qubits by placing individual atoms deterministically below the surface of the three-dimensional structure, thus forming single or few-atom transistors, single-electron transistors or various quantum sensing devices. This kind of dopant engineering technique, having the character of a lithographic method, paves the way to a wide range of possible applications that require complex donor/acceptor arrangements. In that respect, scanning probe methods provided by nano analytik GmbH are an essential part of the process, being used for surface analysis, direct surface modification, nanofabrication and, in particular, as a kind of “high resolution dynamic nano-stencil”. The latter means an integration of a scanning probe system with an ion beam in order to control and align ion implantation at an accuracy of only a few nanometers.
For more information visit: https://www.spiedigitallibrary.org/conference-proceedings-of-spie/11610/116101A/Single-dopant-atom-lithography-for-the-fabrication-of-quantum-computers/10.1117/12.2584612.short?SSO=1