2020: Exhibition at the SPIE Advanced Lithography Conference in San José (USA)

The SPIE Advanced Lithography in San José took place from Feb. 24, to Feb. 27, 2020. SPIE is the primary world lithography event. The program focuses on works in advanced lithography, metrology, and EUV. Industry and academic leaders come to solve challenges in lithography, patterning technologies, and unique materials, while sharing the latest advancements in the semiconductor industry.It brings together the lithography community from academia to production engineers from semiconductor industry. nano analytik GmbH presented a novel-cantilever AFM tool capable for high-speed and high-accuracy imaging.

Our United States partner SEIWA Optical America Inc. exhibited the new unique active-cantilever application in integrated Optical-AFM wafer inspection system at the SPIE 2020 meeting.  The AFM system uses cantilevers with high-aspect ratio Silicon or GaN tips for high performance trench-depth characterization and inspection of advanced masks.

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